Effect of High-Temperature Annealing Heat Treatment to Microstructure of Aluminium Nitride on Sapphire Substrate

Zaimi Tanasta; Pauziah Muhamad; Noriyuki Kuwano; Mohd Hishamuddin Unuh; Mohd Hafiz Amran

Authors

Zaimi Tanasta Department of Mechanical PrecisionEngineering, Faculty of Malaysia Japan International Institute of Technology, Universiti Teknologi Malaysia, 54100 Kuala Lumpur, Wilayah Persekutuan Kuala Lumpur, Malaysia
Pauziah Muhamad Department of Mechanical Precision Engineering, Faculty of Malaysia Japan International Institute of Technology, Universiti Teknologi Malaysia, 54100 Kuala Lumpur, Wilayah Persekutuan Kuala Lumpur, Malaysia
Noriyuki Kuwano Department of Mechanical Precision Engineering, Faculty of Malaysia Japan International Institute of Technology, Universiti Teknologi Malaysia, 54100 Kuala Lumpur, Wilayah Persekutuan Kuala Lumpur, Malaysia
Mohd Hishamuddin Unuh Department of Mechanical Precision Engineering, Faculty of Malaysia Japan International Institute of Technology, Universiti Teknologi Malaysia, 54100 Kuala Lumpur, Wilayah Persekutuan Kuala Lumpur, Malaysia
Mohd Hafiz Amran Department of Mechanical Precision Engineering, Faculty of Malaysia Japan International Institute of Technology, Universiti Teknologi Malaysia, 54100 Kuala Lumpur, Wilayah Persekutuan Kuala Lumpur, Malaysia

Keywords:

Aluminium Nitride, AlN , Annealing Heat Treatment, Inversion Domain, Microstructure

Abstract

Aluminium Nitride(AIN)is classified in the 3rd nitride ceramic materials and able to emit the lights at shorter wave length of 210 nm with high band gap up to 6 eV. In addition, with thermal conductivity up to 140W/mK has made this material in demand for electronic devices applications such as lightemitting diode, laser diode and photodetector for the ultraviolet region. However, previous researchers have confirmed the existence of defects inthe microstructure of AlN that affected the properties of this material during the growth process. Hence, high-temperatureannealing heat treatment isutilized as one of the methods to cure the problems of AlN thin film. Therefore, this paper is about to identify the effects of high-temperature annealing heat treatment on the microstructure of AlN. The changes on microstructure were observed through Transmission Electron Microscopyafter the annealing process. The results showed an increase of the annealing temperature contributed to the reduction of defects in the microstructure of AlN.