Effect of Hydrothermal Reaction Time and Etching on Nanorod TiO2 Thin Film

Authors

  • Muhammad Zuhairi Zulkifli Department of Electronic Engineering, Faculty of Electric and Electronic Engineering, Universiti Tun Hussein Onn Malaysia (UTHM), Parit Raja, 86400 Batu Pahat, Johor, Malaysia
  • Fariza Mohamad Microelectronic and Nanotechnology Shamsuddin Research Centre (MiNT-SRC), Universiti Tun Hussein Onn Malaysia (UTHM), Parit Raja, 86400 Batu Pahat, Johor, Malaysia
  • Shazleen Ahmad Ramli Microelectronic and Nanotechnology Shamsuddin Research Centre (MiNT-SRC), Universiti Tun Hussein Onn Malaysia (UTHM), Parit Raja, 86400 Batu Pahat, Johor, Malaysia
  • Nurliyana Mohamad Arifin School of Engineering and Computing, MILA University, Putra Nilai, Nilai 71800, Malaysia
  • Mohd Khairul Ahmad Microelectronic and Nanotechnology Shamsuddin Research Centre (MiNT-SRC), Universiti Tun Hussein Onn Malaysia (UTHM), Parit Raja, 86400 Batu Pahat, Johor, Malaysia
  • Nik Hisyamudin Muhd Nor Faculty of Mechanical & Manufacturing Engineering, Universiti Tun Hussein Onn Malaysia (UTHM), Parit Raja, 86400 Batu Pahat, Johor, Malaysia
  • Mohd Zamzuri Mohammad Zain Faculty of Mechanical Engineering Technology, Universiti Malaysia Perlis, 02600 Arau, Perlis, Malaysia
  • Masanobu Izaki Department of Electrical Engineering, National Institute of Technology, Nara College, Yamatokoriyama, Nara 639-1058, Japan

DOI:

https://doi.org/10.37934/aram.127.1.120135

Keywords:

TiO2, FTO, hydrothermal, TNRs, etching treatment, etched-TNRs

Abstract

Titanium dioxide (TiO2) has the most potential function in numerous research domains because of its various advantages. Among the variety of ways, TiO2 nanorods (TNRs) are one of interest nanoparticle structures due to their superior delocalisation of the electron holes pair and lower charge recombination. However, TNRs inhibit solar spectrum absorption and have a high resistivity. In this study, etching treatment is introduced to increase the specific surface area and reduce resistivity. The effect of reaction time was investigated on TNRs thin film by using the hydrothermal method. From the findings, the 8-hour reaction time of TNRs thin film revealed the most striking characteristics. The preferred (101)-orientation of TNRs was observed and the diameter of rods increased along with reaction time. As the reaction time rises, the bandgap energy of TNRs approaches the value of 3.0 eV and presents a compact surface. After etching treatment, the peak intensity of (101)-orientation of TNRs increases indicating high crystallinity. The morphology of nanorods changed into smaller rods, apparently a nanowire with deeper depth. The surface roughness and band gap increased due to the surface area affected by etching. The electrical properties of etched-TNRs thin film after showed a reduction of resistivity aligning to thickness decrement. Thus, hydrothermal etching treatment showed effectiveness in enhancing TNRs properties in terms of crystallinity, surface morphology and reducing resistivity.

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Author Biographies

Muhammad Zuhairi Zulkifli, Department of Electronic Engineering, Faculty of Electric and Electronic Engineering, Universiti Tun Hussein Onn Malaysia (UTHM), Parit Raja, 86400 Batu Pahat, Johor, Malaysia

muhammadzuhairi9912@gmail.com

Fariza Mohamad, Microelectronic and Nanotechnology Shamsuddin Research Centre (MiNT-SRC), Universiti Tun Hussein Onn Malaysia (UTHM), Parit Raja, 86400 Batu Pahat, Johor, Malaysia

farizamd@uthm.edu.my

Shazleen Ahmad Ramli, Microelectronic and Nanotechnology Shamsuddin Research Centre (MiNT-SRC), Universiti Tun Hussein Onn Malaysia (UTHM), Parit Raja, 86400 Batu Pahat, Johor, Malaysia

work.shazleen@gmail.com

Nurliyana Mohamad Arifin, School of Engineering and Computing, MILA University, Putra Nilai, Nilai 71800, Malaysia

lyanaarifin@gmail.com

Mohd Khairul Ahmad, Microelectronic and Nanotechnology Shamsuddin Research Centre (MiNT-SRC), Universiti Tun Hussein Onn Malaysia (UTHM), Parit Raja, 86400 Batu Pahat, Johor, Malaysia

akhairul@uthm.edu.my

Nik Hisyamudin Muhd Nor, Faculty of Mechanical & Manufacturing Engineering, Universiti Tun Hussein Onn Malaysia (UTHM), Parit Raja, 86400 Batu Pahat, Johor, Malaysia

nhisyam@uthm.edu.my

Mohd Zamzuri Mohammad Zain, Faculty of Mechanical Engineering Technology, Universiti Malaysia Perlis, 02600 Arau, Perlis, Malaysia

mzamzuri@unimap.edu.my

Masanobu Izaki, Department of Electrical Engineering, National Institute of Technology, Nara College, Yamatokoriyama, Nara 639-1058, Japan

m-izaki@elec.nara-k.ac.jp

Published

2024-11-30

How to Cite

Zulkifli, M. Z., Mohamad, F., Ahmad Ramli, S., Mohamad Arifin, N., Ahmad, M. K., Muhd Nor, N. H., Mohammad Zain, M. Z., & Izaki, M. (2024). Effect of Hydrothermal Reaction Time and Etching on Nanorod TiO2 Thin Film. Journal of Advanced Research in Applied Mechanics, 127(1), 120–135. https://doi.org/10.37934/aram.127.1.120135

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